Ellipsometry is a highly sensitive, non-contact optical measurement technique for the characterization of thin films and surfaces. By analyzing changes in the polarization state of reflected light, it enables the accurate determination of film thicknesses and optical constants, down to the sub-nanometer scale.
Park Systems Imaging Spectroscopic Ellipsometers combine ellipsometry and optical microscopy for the accurate characterization of micro-structured thin films. It delivers ellipsometric accuracy with visual mapping of such data over 2D space at down to 1 µm lateral resolution.