X-Ray Photoelectron Spectroscopy

XPS is based on the photoelectric effect, where atoms in a material absorb the energy from X-ray photons, leading to the emission of electrons from the core levels. The kinetic energy of the emitted photoelectrons is measured by the spectrometer, and this energy is characteristic of the element and its chemical environment. The binding energy of the photoelectrons can be calculated from their kinetic energy and the energy of the X-ray source, providing information about the electronic structure and chemical state of the elements present in the material. The intensity of the photoelectron peaks is proportional to the concentration of the corresponding element within the analysed volume, allowing for quantitative analysis.

Aerospace

• Surface analysis of aerospace materials, coatings, and components
• Characterization of oxidation and corrosion
• Analysis of surface contaminants

Automotive

• Surface characterization of automotive coatings, catalysts, and materials
• Analysis of wear and friction
• Characterization of engine deposits

Chemicals

• Analysis of catalysts, adsorbents, and chemical reactions
• Characterization of surface functional groups
• Study of surface-adsorbate interactions

Consumer Electronics

• Characterization of electronic materials, thin films, and interfaces
• Analysis of surface contamination
• Study of adhesion and bonding

Defense

• Surface analysis of defense materials, coatings, and components
• Characterization of explosive residues
• Analysis of chemical warfare agents

Energy

• Characterization of energy materials, battery electrodes, solar cells, and fuel cell components
• Analysis of surface oxidation and degradation
• Study of electrode/electrolyte interfaces

Law & Litigation

• Forensic analysis of surfaces, trace evidence, and contaminants
• Characterization of gunshot residues
• Analysis of document inks and toners

Lighting & LED

• Characterization of light-emitting materials, coatings, and interfaces
• Analysis of surface defects and impurities
• Study of phosphor materials

Medical Devices

• Analysis of biomaterials, implants, and medical device surfaces
• Characterization of surface biocompatibility
• Study of protein adsorption

Pharmaceuticals

• Characterization of drug formulations, excipients, and pharmaceutical surfaces
• Analysis of drug delivery systems
• Study of drug-polymer interactions

Raw Materials

• Analysis of raw material surfaces, contaminants, and chemical states
• Characterization of surface impurities
• Study of surface modifications

Semiconductors

• Characterization of semiconductor surfaces, thin films, interfaces, and contaminants
• Analysis of surface oxidation and defects
• Study of doping profiles

Telecom & Data Storage

• Analysis of telecommunication materials, coatings, and data storage surfaces
• Characterization of surface properties
• Study of surface degradation

• Surface sensitivity: XPS is highly surface-sensitive, providing information about the top few nano-meters of the sample.
• Chemical state analysis: XPS can distinguish between different chemical states of the same element, enabling the study of chemical bonding and oxidation states.
• Quantitative analysis: The intensity of the photoelectron peaks can be used for quantitative elemental analysis.
• Non-destructive: XPS is a non-destructive technique, allowing further analysis or processing of the sample after analysis.

• Sample size ~0.1-2.5 cm2.
• Sample thickness ~1.2 cm.
• Samples must be ultra-high vacuum compatible (<108 torr).

X-ray Absorption Spectroscopy (XAS)

X-ray Absorption Spectroscopy (XAS) is a powerful analytical technique used to probe the electronic structure and local atomic environment of materials. It is widely utilized in various fields, including materials science, chemistry, physics, biology, and environmental science, to gain insights into the properties and behaviors of different substances.