Secondary-ion mass spectrometry

SIMS operates by bombarding the sample surface with a focused primary ion beam, typically consisting of inert gas ions (e.g., Ar+, Xe+), reactive ions (e.g., O2+, Cs+), or metal ions (e.g., Ga+, Au+, Bi+). The impact of the primary ions causes the sputtering of atoms and molecules from the sample surface, resulting in the emission of secondary ions. These secondary ions are then extracted and analyzed by a mass spectrometer to determine their mass-to-charge ratios, which are characteristic of the elemental or molecular species present in the sample.

The analysis can be performed in two modes: static SIMS and dynamic SIMS. Static SIMS is used for surface analysis, where the primary ion dose is kept low to minimize sample damage, allowing for the analysis of the outermost atomic monolayers. Dynamic SIMS involves a higher primary ion dose, leading to the continuous sputtering of the sample surface, enabling depth profiling and bulk composition analysis.

• Analysis of coatings and surface treatments on aerospace components
• Characterization of aerospace alloys and composites
• Investigation of contamination and corrosion on aerospace materials

• Analysis of automotive coatings and paints
• Characterization of automotive alloys and materials
• Investigation of surface contamination and corrosion

• Elemental analysis of catalysts and adsorbents
• Characterization of thin films and coatings in chemical processes
• Investigation of surface chemistry and reactions

• Analysis of thin films and coatings in electronic devices
• Characterization of semiconductor materials and devices
• Investigation of contamination and defects in electronic components

• Analysis of explosives and propellants
• Characterization of protective coatings and materials
• Investigation of surface contamination and corrosion

• Analysis of thin-film solar cells and photovoltaic materials
• Characterization of battery materials and electrodes
• Investigation of surface chemistry in energy storage devices

• Forensic analysis of trace evidence and gunshot residues
• Characterization of materials and surfaces in criminal investigations
• Investigation of counterfeiting and intellectual property disputes

• Analysis of thin films and coatings in LED devices
• Characterization of LED materials and structures
• Investigation of defects and contamination in LED components

• Analysis of coatings and surface treatments on medical implants
• Characterization of biomaterials and drug delivery systems
• Investigation of surface contamination and biocompatibility

• Analysis of drug formulations and excipients
• Characterization of pharmaceutical materials and coatings
• Investigation of drug-material interactions and contamination

• Elemental analysis of raw materials and precursors
• Characterization of impurities and trace contaminants
• Investigation of surface chemistry and reactions

• Depth profiling of dopants and impurities in semiconductor materials
• Characterization of thin films and coatings in semiconductor devices
• Investigation of surface contamination and defects

• Analysis of thin films and coatings in data storage media
• Characterization of materials and structures in telecommunication devices
• Investigation of surface contamination and defects

• High sensitivity and detection limits for a wide range of elements
• Ability to analyze the surface composition of materials with high spatial resolution
• Can detect both major and minor elements in a sample
• Can analyze both organic and inorganic materials
• Can be used for both qualitative and quantitative analysis
• Can be used for both surface and bulk analysis

• Sample size: Small, typically in the range of 1-10 mm²
• Sample Preparation: The sample surface should be clean and flat, and may require polishing or cleaning procedures to remove surface contamination or roughness.
• The sample must be solid and compatible with high vacuum conditions(Typically below 10⁻⁴ Pa or 10⁻⁶ mbar).