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ToF Elestic Recoil Detection
Types of Techniques
- Inductively coupled plasma-optical emission spectrometry (ICP-OES)
- UV-Vis spectroscopy
- X-Ray fluorescence (XRF)
- Atomic absorption spectroscopy (AAS)
- Time-Resolved Photoluminescence Spectroscopy (TRPL)
- X-Ray Photoelectron Spectroscopy (XPS)
- Auger Electron Spectroscopy (AES)
- Fourier Transform Infrared Spectroscopy (FTIR)
- Atomic Fluorescence Spectroscopy (AFS)
- Infrared (IR) spectroscopy
- Nuclear Magnetic Resonance Spectroscopy
- Time of Flight Secondary Ion Mass Spectrometry (Tof-SIMS)
- Spectrophotometer
- Mössbauer Spectroscopy
- ultra violet photoelectron spectroscopy
- Electron Paramagnetic Resonance (EPR)
- Glow Discharge Optical Emission Spectrometry
- X-ray Reflectivity (XRR)
- Total Reflection-TXRF
- Ion scattering spectroscopy (ISS)
- Rutherford Backscattering Spectrometry (RBS)
- ToF Elestic Recoil Detection
- Spectroscopic Ellipsometry
ToF Elestic Recoil Detection
Time-of-flight-elastic recoil detection analysis (ToF-ERDA) is an ion beam analysis technique used to detect elemental concentrations and compositions in thin layer materials. It is also known as elastic recoil detection (ERD), elastic recoil scattering (ERS), and forward recoil spectrometry (FRS). ToF-ERDA can detect all elements and distinguish between different isotopes of hydrogen, with a sensitivity down to 0.1–0.5 atomic percent. It provides information about the elemental depth profile of the surface, allowing for the description of the vertical order and concentrations of the elements. The technique typically achieves depth resolutions of 5-20 nm and yields quantitative results.
ToF-ERDA uses a heavy ion beam (such as Cl, I, Au) with energies of up to 100 MeV. The energetic ion beam is directed at the sample at a known angle, ionizing the sample atoms. The ions from the sample surface layers recoil in a forward direction. Recoiled ions are then detected using timing detectors and an energy detector. Filters are used to separate electrons from recoil ions. The time-of-flight and energy of the recoil ions are measured simultaneously. The energy detector distinguishes the different masses of the ions. Conversion of time/energy spectra is used to create a depth profile by using the known relationship of energy loss by a unit of length of the ions in the sample.
- Elemental analysis and depth profiling of aerospace coatings
- Profiling light elements in aerospace alloys and composites
- Characterization of automotive coatings and surface treatments
- Analysis of automotive catalysts and exhaust systems
- Elemental analysis of chemical vapor deposition (CVD) films
- Depth profiling of catalysts and adsorbents
- Characterization of thin-film coatings on electronic devices
- Analysis of semiconductor materials and integrated circuits
- Analysis of armor coatings and protective materials
- Depth profiling of explosives and propellants
- Characterization of solar cell materials
- Analysis of nuclear materials and fuel coatings
- Elemental analysis for forensic investigations
- Depth profiling of gunshot residues and explosives
- Characterization of LED materials and coatings
- Analysis of phosphor materials for lighting applications
- Elemental analysis of medical implants and coatings
- Depth profiling of biocompatible materials
- Characterization of pharmaceutical coatings and drug delivery systems
- Analysis of active pharmaceutical ingredients (APIs)
- Elemental analysis of raw materials for quality control
- Depth profiling of impurities and contaminants
- Characterization of semiconductor materials and device structures
- Analysis of thin-film coatings on semiconductor wafers
- Elemental analysis of magnetic and optical storage media
- Depth profiling of telecommunication components and materials
- Capable of detecting all elements and distinguishing between different isotopes of hydrogen
- Can detect concentrations down to 0.1–0.5 atomic percent
- Provides elemental depth profiles with a resolution of 5-20 nm
- Yields quantitative results
- Non-destructive technique, minimizing sample damage
- Suitable for a wide range of materials, including inorganic, semiconductor, and thin-film materials
- Sample Units Required: Typically, a few milligrams of the sample material are required.
- Sample Volume Required: The volume of the sample required is usually in the range of 1-10 cm³.